Equipment

 

SEM/Ga-FIB Microscope FEI Helios NanoLab™ 600i
 

Two beam microscope, combines the advantages of ultra-high resolution electron microscopy and ion microscopy. Energy focused beam of gallium ions allows for the selective removal of material preparation and modification at the nanoscale. This involves the ability to perform cross-sections, a three-dimensional reconstruction and TEM sample preparation, as well as rapid prototyping processes without masked in nano- and microscale.

Parameters

Landing voltage range​:

– electron beam: 350 V – 30 kV

   (50 V – 30 kV with Beam Deceleration mode),

– ion beam: 500 V – 30 kV.

 

Resolution:

– electron beam: 1 nm,*

– ion beam: 2,5 nm.*

 

Maximum sample size:

– diameter: 150 mm diameter with full rotation

   (assembly possible of larger preparations*),

– height: 100 mm,

– weight: 500 g

   (including the sample holder).

Applications

– The ultra-high-resolution imaging of surface preparation.

– Creation and analysis cross-sections in nano- and microscale.

– Selective application of materials in FEBID and FIBID technology.*

– Imaging contrast material preparation.

– The ability to characterize a wide range of formulations

    of conductive and non-conductive without modifying them.*

– Three-dimensional reconstruction of the specimen on the basis 

   of SEM images (approximately 1 000 µm3 volume).

– Preparation of high-quality TEM samples with a thickness of less than 

   100 nm.

– Rapid prototyping of spatial structures in nano- and microscale.

Detectors

– ETD (secondary electrons)

– TLD (secondary electrons)

– ICE (secondary ions)

– CBS (backscattered electrons)

 

222

SEM/Xe-PFIB Microscope FEI Helios PFIB
 

Technology focused ion beam of plasma xenon (Xe-PFIB) allows new, unreachable by any others testing methods. In conjunction with a high-resolution electron microscope and fast EDS detector brand Brucker is the only one in Poland and Europe analytical system. The advantages of the beam of xenon include up to 50 times faster operation than for technologies of gallium (Ga-FIB), lack of implantation and compatibility with most materials (also containing aluminum and gallium).

Parameters

Landing voltage range​:

– electron beam: 50 V – 30 kV,

– ion beam: 2 kV – 30 kV.

 

Resolution:

– electron beam: 1 nm,*

– ion beam: <25 nm.*

 

Maximum sample size:

– diameter: 150 mm diameter with full rotation

   (assembly possible of larger preparations*),

– height: 100 mm,

– weight: 500 g

   (including the sample holder).

Applications

– The ultra-high-resolution imaging of surface preparation.

– Create maps of elemental EDS, analysis of point and linear elemental  

   composition.

– Creation and analysis cross-sections in nano- and microscale.

– Selective application of materials in FEBID and FIBID technology.*

– Imaging contrast material preparation.

– The ability to characterize a wide range of formulations

    of conductive and non-conductive without modifying them,*

– Three-dimensional reconstruction of the specimen on the basis 

   of SEM images (approximately 1 000 µm3 volume).

– Preparation of high-quality TEM samples with a thickness of less than 

   100 nm – compatibility with the materials based on aluminum and

   gallium.

– Rapid prototyping of spatial structures in nano- and microscale.

– Etching material without leaving artifacts (e.g. implanting gallium).

Detectors

– ETD (secondary electrons)

– TLD (secondary electrons)

– CBS backscattered electrons)

– ICE (secondary ions)

– EDS (characteristic X-rays*)

 

3a

Atomic Force Microscope (AFM) Nanosurf FLEX-Axiom
 

Microscopy AFM enables the testing of surfaces with atomic resolution. Perfectly reflects the surface morphology, allows the analysis of the electrical properties of electrical structures (connectors, transistors, etc.). Our device allows the measurement of quality and quantity. Sound insulation and vibration damping system ensures stable operation.

Parameters

– Maximum working field: 100 µm x 100 µm.

– Height range of the scanner: 10 µm.

– Operating modes: static force, dynamic force, force modulation

   spreading resistance.

– Maximum sample size: unlimited.*

– Maximum sample height: unlimited.*

Applications

– Investigation of surface morphology.

– Mapping stiffness and surface conductivity (resistance).

– Measurements of the thickness of layers.

– Statistics of nanoparticles sizes.

 

444

Plasma cleaning device Plasma Harrick PDC-32G-2
 

A device which uses the method of physiochemical purification samples. Ideally suited for cleaning samples in nano- and microscale. The cleaning process takes place in a vacuum, is fully automated and extremely fast (takes about 2 minutes). The surface is cleaned physically or chemically, by ion bombardment of inert gases or reactive. Impurities are processed into the gas phase and extracted.

Parameters

– Chamber dimensions: 75 mm diameter x 170 mm deep.

– Maximum RF power: 18 W.

– RF frequency range: 8 -12 MHz.

Applications

– Clean surfaces.

– Surface activation.

– Plasma etching.

 

Ultrasound Cleaner IS-28
 

Ultrasonic technology is used for cleaning details with high surface area. Ultrasound energy reaches the hard-holes and crevices. The washing process consists of generate pressure waves of high frequency, causing cavitation in the bath. Air bubbles implode on the surface of the object to be purified and remove dirt particles (oil, dust, polishing pastes, chips, etc.). Ultrasonic cleaning prevents damage to mechanical parts, ensuring the highest quality and precision cleaning. Efficiency exceeds the traditional, manual and spray cleaning methods.

Parameters

– Internal dimensions of the tub: 320 x 320 x 280 mm.

– Capacity: 28,0 l.

– Temperature control: 20-70°C.

Applications

– Pre-washing preparations.

– Cleaning parts of the organic pollutants.

 

6666

Stereo Zoom Microscope Motic SMZ-171-TLED
 

High class microscope Greenough system (smooth zooming). In our laboratory, this tool is designed for initial optical inspection preparations.

Parameters

– Optical magnification: 7,5x – 50x.

– Work distance: 110 mm.

Applications

– Initial inspection of optical preparations.

 

777

Pumped Carbon Coater Quorum Technologies Q150T E
 

Rotary sputter vacuum is a device which is ideally suited for sample preparation for scanning electron microscopy (SEM) and ion (Ga-FIB/Xe-PFIB). It allows the application of stable, very thin conductive carbon coatings, which are removed after analysis.

Parameters

– Working platform: 50 mm diameter.

Applications

– Preparing preparations for SEM analysis, Ga-FIB/Xe-PFIB.

 

* For more detailed information, please contact with our engineers